In advanced semiconductor processes — PVD, CVD and ALD among them — the purity of the vacuum environment directly determines yield. A single micro-leak or an almost imperceptible trace of reaction by-product can scrap an entire wafer lot, bringing unplanned downtime and real cost pressure.

The HM-150 High-Pressure Residual Gas Analyzer (RGA) is engineered specifically for elevated-pressure, demanding process environments. It acts as a frontline defense against yield loss on the production line, setting a new benchmark for yield protection with proven in-house technology and keeping high-end manufacturing stable run after run.

1. Eight Engineered Capabilities Take Process Monitoring Further

Built on advanced quadrupole mass spectrometry, the HM-150 meets the monitoring demands of complex, elevated-pressure processes across accuracy, stability and response speed.

01 | Elevated-Pressure Compatibility, Ready for Multiple Processes

Supports operating pressures up to 2 Pa, making it a direct fit for PVD, CVD and ALD monitoring. It integrates into existing lines quickly, with no complex retrofitting required.

02 | Full-Spectrum Scanning, Precise Identification

Dual mass ranges of 1–50 amu and 1–100 amu, with both full-spectrum and selected-mass scanning. It cleanly resolves H₂, He, N₂, O₂, Ar and other species for fast qualitative and quantitative analysis.

03 | Dual Detectors, Full Concentration Coverage

A Faraday Cup (FC) paired with a Microchannel Plate (MCP) covers everything from bulk process gases down to trace-level signals on one platform.

04 | Sensitivity That Pinpoints the Contamination Source

A partial-pressure detection limit down to 2 × 10⁻⁹ Pa captures both process-gas drift and ppt-level trace contaminants before they reach the wafer.

05 | Dual Filament Protection for Corrosive Chemistries

Yttria-coated iridium / tungsten dual-filament options stand up to halogen-containing and other corrosive gases, extending critical-component life and cutting maintenance frequency and cost.

06 | Millisecond Response, In Step with the Process

A 3 ms per point scan rate acquires and analyzes gas-phase data in real time, staying synchronized with process transitions so contamination risks surface immediately and data acquisition stays effectively lag-free.

07 | Smart Alarming for the Digital Fab

API integration with automated monitoring and alarm functions enables automatic data capture, analysis and anomaly alerts, supporting the move toward intelligent, connected production lines.

08 | Clean Separation, Dependable Data

A high-precision metal quadrupole delivers excellent mass-to-charge (m/z) resolution and unit-to-unit consistency, separating components in complex gas mixtures to give process optimization a reliable data foundation.

2. One Platform Across High-End Manufacturing

The HM-150 extends well beyond a single process step:

Semiconductors: PVD / ALD / CVD (evaporation and sputtering), Molecular Beam Epitaxy (MBE)

Advanced Displays: OLED organic evaporation

New Energy: lithium-metal batteries, solid-state battery electrode fabrication, hydride-based hydrogen storage materials, photovoltaic production

Advanced Materials: vacuum melting and sintering of refractory and reactive metals, vacuum brazing and heat treatment

Optics & Photonics: precision optical coating and optoelectronic device manufacturing

3. Three Pain Points, Three Direct Answers

Challenge 1 — Trace contamination is hard to monitor under elevated pressure

In PVD, CVD and similar processes, conventional RGAs cannot reliably resolve trace impurities, so contamination goes undetected until yield starts to drift.

HM-150 answer: 2 Pa operating-pressure compatibility combined with a 2 × 10⁻⁹ Pa partial-pressure detection limit locks onto trace impurities even under elevated pressure, preventing process contamination before it spreads.

Challenge 2 — Corrosive gases shorten instrument life

In halogen-containing processes, critical components degrade quickly. Frequent replacement drives up cost and forces line downtime.

HM-150 answer: yttria-coated iridium / tungsten dual-filament protection resists aggressive chemistries, keeping core components stable for longer and sharply reducing maintenance cost and downtime.

Challenge 3 — Lagging data delays process correction

Conventional monitors respond too slowly to track process changes in real time; by the time an issue is confirmed, a batch has already been scrapped.

HM-150 answer: 3 ms per point scanning plus real-time smart alarming delivers lag-free acquisition and immediate anomaly alerts, so process adjustments happen in time.

Master the Vacuum Details, Win the Yield Battle

With proprietary in-house technology, the HM-150 High-Pressure RGA gives manufacturers a yield-loss defender that balances precision, stability and cost-performance — helping precision manufacturing move both yield and efficiency forward.

Facing elevated-pressure monitoring challenges, looking to stabilize your process or bring production costs down? Get in touch for the full HM-150 datasheet and a tailored solution.