Answering the need for reliable gas monitoring under complex, multi-pressure conditions, Hirays debuts the HM-230 Multi-Pressure Residual Gas Analyzer (RGA): a domestically developed instrument built for advanced process nodes. Integrating the RGA, a vacuum system and an intelligent sampling module into a single in-line mass spectrometry platform, it adapts efficiently to wide-pressure, multi-recipe environments and keeps advanced processes running steadily.

1. Nine Core Values That Raise the Bar for In-Line Gas Monitoring

01 | Wide-Pressure Compatibility, Beyond Conventional Limits

Covers a full 1 × 10⁻⁸ Torr to 1.2 atm range via its wide-pressure inlet, with three mass-range options: 1–100, 1–200 and 1–300 amu. It monitors H₂, He, N₂, O₂, Ar and other key species in real time, holding stable across diverse process conditions.

02 | In-Line Analysis, Real-Time Risk Alerts

Millisecond-level response tracks gas composition as it changes. Any abnormal fluctuation triggers an immediate alarm, locking down contamination and process-drift risks before they turn into batch scrap.

03 | All-in-One Integration, Plug-and-Measure Deployment

The RGA, vacuum system and sampling module are tightly integrated, so no separate vacuum skid has to be built. The unit connects directly to the line, shortening project lead time and lowering deployment cost.

04 | Contamination-Resistant Design for Long-Term Stability

An anti-contamination coating combined with surface passivation limits process deposits on critical components, extending service life and keeping long-term monitoring data stable and consistent.

05 | Dual-Mode Detection, Precision Across the Range

A Faraday Cup (FC) and Electron Multiplier (EM) work in tandem — high sensitivity for trace gases, wide dynamic range for high-concentration components — so even complex gas mixtures can be identified and quantified accurately.

06 | Built-In Analytics, Less Operator Dependence

Embedded algorithms handle automatic qualitative and quantitative analysis and anomaly alarming, lowering the operating skill threshold and labor cost.

07 | Ready for the Connected Fab

API integration and data upload connect quickly to MES and equipment control systems, enabling process data interoperability and supporting digital factory-wide control.

08 | Broad Process Compatibility

Suited to CVD, PVD, ALD, etch, vacuum coating and other advanced processes. A single instrument covers gas monitoring across multiple recipe types and customer scenarios.

09 | Proprietary Core, Shorter Lead Times, Secure Supply

Core components are developed in-house, enabling shorter delivery cycles. A local engineering team provides rapid response, safeguarding supply chain security and customers' volume production.

2. Why Complex Processes Demand In-Line Monitoring

Because in advanced manufacturing, critical failures rarely happen suddenly. They announce themselves first — through changes in the gas phase.

A drifting precursor ratio, an unexpected rise in by-products, chamber contamination, a micro-leak, an abnormal deposition signature… if these are not caught in real time, they become yield swings, batch scrap and unplanned downtime.

The value of the HM-230 is exactly this: it finds the problem before the problem grows.

3. Typical Applications Across Advanced Manufacturing

· CVD: monitors precursor gas ratios in real time to prevent non-uniform reaction

· PVD: detects residual gases in the vacuum chamber to reduce film defects

· ALD: controls pulse gas concentration to improve deposition uniformity

· Etch: flags abnormal etch by-products quickly to avoid over-etch or residue

· Vacuum coating: tracks gas-phase changes throughout film growth

· Leak & contamination monitoring: pinpoints micro-leaks immediately, cutting troubleshooting downtim

4. Four Pain Points, Four Direct Answers

Challenge 1 — Narrow pressure coverage

Conventional RGAs cover only a limited pressure window and cannot serve the varied pressure demands of multi-process lines.

HM-230 answer: wide-pressure inlet technology delivers full 1 × 10⁻⁸ Torr to 1.2 atm coverage, so one instrument serves multiple processes.

Challenge 2 — Contamination drives up maintenance

Impurities in process gas foul the detector, shortening its life and raising maintenance cost.

HM-230 answer: the built-in contamination-resistant design limits fouling of critical components, reducing service frequency and improving instrument uptime.

Challenge 3 — Offline analysis is too slow

Offline sampling lags behind the process and cannot capture anomalies in real time, leading to batch yield loss.

HM-230 answer: real-time in-line monitoring with millisecond-level response delivers early alerts, stopping risks before they escalate.

Challenge 4 — Integration cost is high

A separate vacuum system and sampling setup mean long deployment cycles and added cost.

HM-230 answer: the all-in-one design is plug-and-measure, cutting both integration cost and project timeline.

More Than an Analyzer — A Round-the-Clock Sentinel on the Line

The HM-230 RGA is not just a gas analysis instrument. It is a round-the-clock gas sentinel standing watch on the production line.

As yield competition intensifies, it helps you spot hidden risks earlier, reduce downtime and tune processes with confidence — making every deposition, etch and coating step more controllable.

Facing process gas monitoring challenges, or want the full HM-230 specification? Get in touch for product details and a tailored solution — and make your process smarter, more stable and more efficient.